News Article
Successful Oxford Instruments seminar held in Shanghai
Presentations held during the one day program included topics such as Atomic Layer Deposition, Photovoltaics, Deep Silicon Etch and Ion Beam technologies
The recent Nanoscale Plasma Processing Seminar organised by Oxford Instruments in Shanghai attracted over 70 attendees from both academia and production, from China and Taiwan.
The company organises these events worldwide several times a year, and has previously co-hosted with organisations such as the IOS-CAS in Beijing, LBNL, Caltech and Cornell in the USA, Universities of Southampton and Glasgow in the UK, and TU/e in the Netherlands.
As a supplier of systems and processes for plasma etch and deposition, the company was honoured that so many invited guest speakers participated, all specialists in their field from China, Taiwan and Europe. Process and Applications experts from Oxford Instruments Plasma Technology gave a number of talks on the company’s technologies and process solutions.
Oxford Instruments thanking their guest speakers for assisting in making the Shanghai Seminar such a success
These events aim to encourage interest in developments within industrial and research communities using Plasma and Ion Beam Etch and Deposition process techniques. They are an ideal means for participants to learn more about latest techniques and findings in an informal atmosphere where participation and interaction are encouraged.
Talks included topics such as Atomic Layer Deposition (ALD), Photovoltaics (PV), Deep Silicon Etch and Ion Beam technologies during the one day programme.
Guest speakers included: Erwin Kessels, from University of Eindhoven (TU/e), Netherlands; Chu Ann-Kuo, Department of Photonics, National Sun Yat-sen University, Taiwan; Zhenghua YE, SITP (Shanghai Institute of Technology Physics); Juncong SHE, Sun Yat-Sen University, China; and Jerry Wang, Manager of Microsystems Technology Centre, ITRI, Taiwan.
Mark Vosloo, Sales, CS and Marketing Director, Oxford Instruments comments, “We were pleased to have attracted such a large and high calibre audience to this Seminar in Shanghai, and are extremely honoured that so many distinguished guest speakers gave their time to speak about their work in Plasma Processing. Our Seminars offer a fantastic opportunity for the wider Plasma Processing community to meet and share their experiences, and to learn more from leading international experts in their field.”
Oxford Instruments is planning more seminars worldwide for 2012.
