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Trumpf Photonics to use Aixtron tool for As/P laser growth

The AIX 2800G4 reactor will be used in the production of arsenide and phosphide high power lasers

Aixtron SE has announced that Trumpf Photonics, located in Princeton, New Jersey, USA has taken delivery of an Aixtron AIX 2800G4 MOCVD reactor for high power laser applications.

Carl Miester, Head of Production Semiconductors at Trumpf Photonics states, “Trumpf Photonics has been delivering high quality laser components to the high power laser industry for over 10 years. The recent increase in market demand has required us to upgrade our manufacturing capabilities. We have performed an exhaustive search of the current MOCVD technologies."

He continues, "The enhancements Aixtron has made in the control of the MOCVD process has made it the ideal platform for the challenging structures required for the high power laser market. Aixtron was the platform of choice from our beginnings and we are pleased they will be working with us as we move into the future.”

Aixtron’s Chief Operating Officer, Bernd Schulte, adds, “We are particularly pleased with our sustained relationship with the Trumpf organisation and to have the unique opportunity of being a vendor to Trumpf Photonics. Aixtron has maintained its investment in the development of MOCVD technology for all compound semiconductor material systems such as As/P materials for the solid state laser markets. Trumpf’s decision to continue to use our platform provides confirmation that these investments have been successful."

The Trumpf Group has 58 subsidiaries and branch offices in more than 26 countries, employs over 8,500 people, and generates sales in excess of US $2.76 billion. The company is an innovator in sheet metal fabrication machinery and industrial lasers.
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