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Michelle Bourke announced as guest speaker at CS International Conference, Frankfurt

CS International are pleased to announce Michelle Bourke, Senior Product Manager, Oxford Instruments Plasma Technology has been confirmed as a guest speaker for the Compound Semiconductor industry's premier international event, CS International, which will held in Frankfurt, Germany on 4th & 5th March 2013, her presentation will focus on plasma etch and deposition processes for leading compound semiconductor device technologies.

Michelle will join the two day event with speakers coming from a wide range of organisations including leaders from Intel Corporation,Aixtron, Epistar Corporation, RF Micro Devices (RFMD), TriQuint Semiconductor and over 25 other leading chipmakers giving their perspective on the latest developments in device technology.

Professionals from around the world will attend this two day event to hear key insights and opportunities, from a range of leading analysts, and learn of the latest chip developments in LEDs, solar cells, lasers and power and RF electronics.

Delegates will have the opportunity to network with leading industry professionals of the III-V chip making industry and interact with suppliers.

Michelle M. Bourke received a BSc degree in Optoelectronics and Laser Engineering from Heriot-Watt University, Edinburgh, Scotland, UK.  Initially beginning her career in the UK Government labs working on advanced optoelectronic and electronic devices she migrated to the equipment vendor environment where she developed a broad range of etch processes relating to silicon and compound semiconductor devices.  Prior to joining Oxford she worked with other equipment vendors in Business Development and Product Marketing roles.  Today Michelle is a Senior Product Manager at Oxford Instruments.

Further information is available on the CS International website at: www.cs-international.netor calling 44 (0) 24 7671 8970.

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