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Ferdinand-Braun orders tool for laser diode deposition

Oxford Instruments’ ion beam Optofab3000 system will be used to deposit 0.63 µm to 1.12 µm III-V semiconductor layer structures
Research organisation, the Ferdinand-Braun-Institut (FBH) has ordered an Optofab3000 for laser bar facet coating.

The ion beam deposition tool from Oxford Instruments Plasma Technology, further expands FBH's capability in optoelectronics research & pilot production.

A similar ion beam system to the one that will be delivered to FBH

The Optofab3000 tool will be used to deposit high quality optical thin films for high-power and high-brightness laser diodes at wavelengths in the range from 0.63 µm to 1.12 µm, that are based on III-V semiconductor layer structures.

Götz Erbert, Head of the Optoelectronics Department at FBH, comments, “We have chosen the Optofab3000 ion beam deposition tool because of its capability to deposit high quality optical films as well as its advanced in-situ optical monitor. Another key factor in making our decision was the twin benefits of a tool that can achieve our high-specification requirements with a small footprint. While we are primarily an R&D institute we also undertake pilot production, and consequently need to achieve the highest quality end product possible. ”

 ”We are extremely pleased to have the opportunity to work with a prestigious research institution like FBH “, adds Mark Vosloo, Director of Sales, Marketing and Customer Support at Oxford Instruments Plasma Technology.  “Their decision to order an Optofab3000 for Laser Bar Facet Coating from Oxford Instruments further establishes our ion beam products in the field of optoelectronics research & production.”

The Optofab3000 ion beam tool is scheduled to be delivered by the end of 2012.

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