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News Article

Plansee improves sputtering performance for CIGS production

The firm has introduced a new inner diameter coating which enables CIGS manufacturers to increase sputtering performance in monolithic molybdenum targets
Plansee's new coating prevents direct contact between the target material and cooling water during the sputtering process.

The firm will present its "upgraded rotary target" at the EU PVSEC in Frankfurt.

Monolithic targets with inner diameter coating molybdenum sputtering targets are used to deposit the back contacts in CIGS cells by magnetron sputtering.





Image showing the upgraded rotary target

Monolithic rotary targets have no backing tube. They consist entirely of the thin film material.

Plansee says that thanks to these targets, CIGS manufacturers can considerably increase sputtering performance and consequently achieve greater throughput. The particularly high level of material utilisation also reduces the total cost of ownership in solar cell production.

When monolithic targets are used, the molybdenum is in direct contact with the cooling water inside the sputtering equipment. Additional particular additives (so-called inhibitors) have to be used to condition the cooling water for operation with monolithic targets. These stabilise the pH-value of the cooling water.

Plansee has now developed a protective coating for the inner diameter (ID) wall of the target, designed to make it even easier to use monolithic targets. This polymer-based layer ensures that the molybdenum no longer is exposed directly to the cooling water. The advantage is that CIGS manufacturers do not need to use the additional inhibitors and are therefore able to reduce their costs. Plansee points out that the ID coating does not noticeably impair the thermal conductivity of the rotary target.

 

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