News Article
Hiden unveils SIMS tool family trio
Hiden Analytical is offering the choice of three initial equipment levels to suit a broad spread of budget capacities
Secondary ion mass spectrometry (SIMS) is a versatile, highly-sensitive technique for surface analysis and surface depth profiling of diverse materials.
The technique can reveal details of contamination in bubblers such as TMGa and TMAl used in the MOCVD growth of III-V semiconductors.
Hiden Analytical has expanded its primary system options to offer the choice of three initial equipment levels to suit a broad spread of budget capacities. All systems offer full UHV operation and expandability to the top-level specification.
The dual-mode MAXIM mass spectrometer features operation both in the secondary ion mode and in the secondary neutral (SNMS) quantification mode.
The Foundation SIMS System includes the IG20 fine-focus (50 µm) oxygen/argon ion gun, multiple sample holder and primary ion beam monitor.
An uplifted version - the SIMS Workstation - is configured for higher throughput rates with the addition of a sample load lock and sample manipulator, together with charge-neutralising electron flood gun and system bakeout facility.
The SIMS Workstation Plus has the most comprehensive specification with the addition of the IG5C Caesium ion gun for electronegative species, having a spot size of just 20 µm.
The MASsoft Professional SIMS PC data system provides automated measurement of positive and negative ions and of neutral species. It enables full control of the mass spectrometer and ion gun operating parameters and ion beam raster, with acquired data presented in real time.
The ESM LabVIEW SIMS Imaging program acquires, stores and displays the data for presentation in the form of elemental surface maps with both 2D and 3D view capabilities.
Times for analysis are down to just 150 milliseconds.
The technique can reveal details of contamination in bubblers such as TMGa and TMAl used in the MOCVD growth of III-V semiconductors.
Hiden Analytical has expanded its primary system options to offer the choice of three initial equipment levels to suit a broad spread of budget capacities. All systems offer full UHV operation and expandability to the top-level specification.
The dual-mode MAXIM mass spectrometer features operation both in the secondary ion mode and in the secondary neutral (SNMS) quantification mode.
The Foundation SIMS System includes the IG20 fine-focus (50 µm) oxygen/argon ion gun, multiple sample holder and primary ion beam monitor.
An uplifted version - the SIMS Workstation - is configured for higher throughput rates with the addition of a sample load lock and sample manipulator, together with charge-neutralising electron flood gun and system bakeout facility.
The SIMS Workstation Plus has the most comprehensive specification with the addition of the IG5C Caesium ion gun for electronegative species, having a spot size of just 20 µm.
The MASsoft Professional SIMS PC data system provides automated measurement of positive and negative ions and of neutral species. It enables full control of the mass spectrometer and ion gun operating parameters and ion beam raster, with acquired data presented in real time.
The ESM LabVIEW SIMS Imaging program acquires, stores and displays the data for presentation in the form of elemental surface maps with both 2D and 3D view capabilities.
Times for analysis are down to just 150 milliseconds.
