News Article
Oxford Instruments revolutionises single wafer etch technology
The firm's PlasmaPro 100 Sapphire can be used for etching III-nitride HBLED materials and is claimed to minimise cost of ownership and maximise yield
Oxford Instruments Plasma Technology a major supplier of plasma processing equipment, presents an evolution in single wafer etch technology, the PlasmaPro 100 Sapphire.
Designed to enable the Solid State Lighting revolution, Oxford Instruments has applied its experience of etching all HBLED materials to this new system that minimises cost of ownership and maximises yield.
PlasmaPro 100 Sapphire tool
The PlasmaPro 100 Sapphire single wafer etch system offers smart solutions to produce the etch results required to maintain the manufacturers’ competitive edge in this rapidly expanding market sector.
Michelle Bourke, Production Business Group Director at Oxford Instruments,says, “The PlasmaPro 100 Sapphire is designed specifically to address the harsh chemistries required for HBLED materials, delivering fast etch rates uniformly on wafers up to 200mm in diameter. At Oxford Instruments we strive to provide the most innovative, cost effective and reliable process solutions for our customers. This latest system is designed to encompass all these requirements.”
Key system features and benefits include: Electrostatic Clamp technology capable of clamping Sapphire, GaN on Sapphire and Silicon; a high power ICP source producing a high density plasma; magnetic spacer for enhanced ion control; and a high conductance pumping system delivering maximum gas throughput at low pressures. Above all it has been developed with reliability, uptime and ease of serviceability in mind.
Solid-state lighting has the potential to revolutionise the lighting industry. LEDs traditionally used in displays are evolving to provide illumination for domestic use as governments legislate globally to make consumers switch to energy-efficient LEDs.
Oxford Instrument’s PlasmaPro 100 Sapphire’s technology promises manufacturers the tools to deliver more efficient, lower cost lighting that is needed worldwide to assist the lighting revolution.
Designed to enable the Solid State Lighting revolution, Oxford Instruments has applied its experience of etching all HBLED materials to this new system that minimises cost of ownership and maximises yield.
PlasmaPro 100 Sapphire tool
The PlasmaPro 100 Sapphire single wafer etch system offers smart solutions to produce the etch results required to maintain the manufacturers’ competitive edge in this rapidly expanding market sector.
Michelle Bourke, Production Business Group Director at Oxford Instruments,says, “The PlasmaPro 100 Sapphire is designed specifically to address the harsh chemistries required for HBLED materials, delivering fast etch rates uniformly on wafers up to 200mm in diameter. At Oxford Instruments we strive to provide the most innovative, cost effective and reliable process solutions for our customers. This latest system is designed to encompass all these requirements.”
Key system features and benefits include: Electrostatic Clamp technology capable of clamping Sapphire, GaN on Sapphire and Silicon; a high power ICP source producing a high density plasma; magnetic spacer for enhanced ion control; and a high conductance pumping system delivering maximum gas throughput at low pressures. Above all it has been developed with reliability, uptime and ease of serviceability in mind.
Solid-state lighting has the potential to revolutionise the lighting industry. LEDs traditionally used in displays are evolving to provide illumination for domestic use as governments legislate globally to make consumers switch to energy-efficient LEDs.
Oxford Instrument’s PlasmaPro 100 Sapphire’s technology promises manufacturers the tools to deliver more efficient, lower cost lighting that is needed worldwide to assist the lighting revolution.
