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Pall to unveil latest filtration and purification technologies

The firm's new products will help semiconductor device and wafer manufacturers detect certain key contamination levels, and clean and maintain control of their fluids to enhance yields

Pall Corporation will introduce several new filtration and purification technologies at SEMICON West in San Francisco from July 9th to 11th that will advance semiconductor manufacturing technology.

The new technologies include:

The Gaskleen High-Bright purifier: This will help ensure consistent, cost-effective delivery of the pure ammonia needed to make LEDs with the highest luminosity. The purifier is a highly efficient product designed to remove molecular contaminants from ammonia used in the manufacture of HB LEDs.

Featuring twice the service life of other commercially available technologies, the new purifiers will help ensure consistent, cost-effective delivery of pure ammonia needed to make LEDs with the highest luminosity.

The Gaskleen purifier assemblies combine Pall’s proprietary purification materials and Ultramet-L stainless steel filter media. They remove moisture and other oxygenated compounds from ammonia to sub ppb levels, while providing 3 nm or 0.4 micron filtration. What's more, they do not release metal ions into the process stream, further increasing luminosity.

Gaskleen High-Bright purifier

Advanced 12 nm Filtration Membrane for Wet Chemical Processing: This is a key addition to Pall’s chemical filter lineup is the new 12 nm XpressKleen filter and all PFA disposable assemblies. This filter uses an advanced molecular surface tailoring (MST) process to remain wet in critical aqueous chemicals like SC1 and SC2.

It also features an improved patent-pending PTFE membrane that easily stands up to the conditions of new, higher temperature processes. This new filter maintains critical fluid purity with guaranteed claims for ultra-low metal ion extractables (< 3 ppb), particle rinse-up and organics. Advanced manufacturing, incorporating statistical process controls, assures repeatable and reliable performance.

Gaskleen Pico1000 Analyser for Moisture in Nitrogen: This measures trace moisture in nitrogen process gas streams, with a limit of detection of 1 part per billion (ppb). It is ideally suited for qualifying and certifying ultra-high purity (UHP) process gas lines, as well as for detecting end-of-life when deployed downstream of our Gaskleen purifiers. The robust, compact design of the analyser is readily portable, allowing users to easily move it around the fab for quick checks of process gas quality at many points. In addition, the Pico1000 consumes up to 70 percent less process gas, compared to competitive analysers, and for a cost saving of 30 percent over traditional 1 ppb moisture analysers.

100 nm Filtration Medium for Point-of-Use Chemical Mechanical Planarisation: Pall will feature its new CMP StarKleenTM Nano filter capsule specifically designed for the classification of ceria and low solids, colloidal silica CMP slurries.

The CMP StarKleen 100 nm filter performs 30 percent better in terms of defectivity reduction than its predecessor for both shallow trench isolation (STI) and barrier copper processes. The product utilises Pall’s most advanced melt blown technology and is manufactured using a proprietary process that enables greater control of pore sizes and gradient. The capsule is available in multiple lengths thus allowing for usage over a wide range of flow rates.

Pall will be at booth #1519 at SEMICON West 2013 in the South Hall at the Moscone Centre in San Francisco from July 9th to 11th.

The Pall Microelectronics team supports customers in the semiconductor, data storage, fibre optic, display, LED and solar energy materials industries with innovative detection, filtration, and purification products, and deep applications expertise, for chemical, gas, water, chemical mechanical polishing and photolithography processes.
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