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Meaglow To Upgrade ALD Nitride Deposition Tool In Turkey

The hollow cathode plasma source reduces the oxygen contamination in ALD systems and increases the quality of thin III-nitride films during growth


Meaglow is to install a hollow cathode plasma source for the group of Necmi Biyikli, a professor at the Institute of Materials Science and Nanotechnology, at Bilkent University in Turkey.

The plasma source is being used to upgrade their Atomic Layer Deposition (ALD) system by replacing an inductively coupled plasma source. This enhancement will reduce the oxygen contamination in ALD systems and increase the quality of nitride thin films grown.

The III-nitrides grown at the university with the ALD system are used for LEDs and power electronic applications. The actual materials grown using the system are AlN, GaN and InN.

Bilkent University researchers will  be presenting some of their findings about suitable applications for these products at the ALD 2013 conference on Wednesday.:

The presentation will take place from 9:00 - 9:15am and is entiltled, "Characterization and Electronic Device Applications of III-nitride Thin Films Deposited by Plasma-enhanced ALD," and will be presented by student finalist C. Ozgit-Akgun from Bilkent.

 

"The Bilkent system was easy to retrofit and the Meaglow Plasma source was the perfect solution for their oxygen contamination problem," says Butcher, Chief Scientist of Meaglow.



ALD system converted with a hollow cathode plasma source

Initial results show a significant reduction of oxygen content in compound nitride films grown. Results will be presented October 27th to November 1st at the 224th ECS Fall Meeting in San Francisco, California at an invited talk presented at the symposium on "Atomic Layer Deposition Applications".

Meaglow is now focused on commercialising its hollow cathode plasma technology which also has the advantage of scalability to large deposition areas. Meaglow is seeking additional ALD system owners and suppliers interested in removing the oxygen contamination in their films.





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