News Article
McGill University selects Veeco multi-chamber reactor
TheGENxpor system will be used for light emitting and power electronic device research
McGill University in Montréal, Québec, Canada has ordered Veeco’s new GENxplor R&D MBE system for its Electrical and Computer Engineering Department, as part of a research grant from Canada’s Foundation for Innovation.
The Veeco GENxplor is a fully integrated system that deposits high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge compound semiconductor research on a wide variety of materials including arsenides, nitrides and oxides.
The GENxplor will be used by Zetian Mi and his team for the development of nitride materials in light emitting and power electronic devices. Nitride materials have demonstrated significant advantages over traditional silicon-based power electronics devices using high power and high temperatures. As a result, nitride materials are attracting investments to develop new devices and processes for this emerging market.
“We are excited about the impact that Dr. Mi and his team will have on the development of more efficient power electronic devices using Veeco’s new GENxplor,” comments Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “The GENxplor, currently nominated for a CS Industry 2014 award, has quickly become the R&D system of choice for leading research institutions. Its modular and flexible design allows multiple deposition chambers, which made it an ideal fit for McGill University.”
The GENxplor MBE System is Veeco’s latest innovation for the R&D market, enabling growth on up to 3”wafers. The system combines the best of Veeco’s R&D products to bring a low-cost, vertically oriented reactor to the market. Innovations such as a single-frame cantilevered design with fully integrated electronics and controls not only reduce the footprint by 40 percent compared to other systems but also improve the usability, serviceability, and installation time.
When coupled with Veeco’s bellows-free retractable sources, the GENxplor allows for virtually uninterrupted operation and enables leading edge materials research, allowing users’ more time to focus on their research. The GENxplor was recently selected as a finalist for the Compound Semiconductor Manufacturing Award 2014. Voting is open through February 14th and can be found at www.csawards.net/voting.
The Veeco GENxplor is a fully integrated system that deposits high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge compound semiconductor research on a wide variety of materials including arsenides, nitrides and oxides.
The GENxplor will be used by Zetian Mi and his team for the development of nitride materials in light emitting and power electronic devices. Nitride materials have demonstrated significant advantages over traditional silicon-based power electronics devices using high power and high temperatures. As a result, nitride materials are attracting investments to develop new devices and processes for this emerging market.
“We are excited about the impact that Dr. Mi and his team will have on the development of more efficient power electronic devices using Veeco’s new GENxplor,” comments Jim Northup, Vice President, General Manager for Veeco’s MBE Operations. “The GENxplor, currently nominated for a CS Industry 2014 award, has quickly become the R&D system of choice for leading research institutions. Its modular and flexible design allows multiple deposition chambers, which made it an ideal fit for McGill University.”
The GENxplor MBE System is Veeco’s latest innovation for the R&D market, enabling growth on up to 3”wafers. The system combines the best of Veeco’s R&D products to bring a low-cost, vertically oriented reactor to the market. Innovations such as a single-frame cantilevered design with fully integrated electronics and controls not only reduce the footprint by 40 percent compared to other systems but also improve the usability, serviceability, and installation time.
When coupled with Veeco’s bellows-free retractable sources, the GENxplor allows for virtually uninterrupted operation and enables leading edge materials research, allowing users’ more time to focus on their research. The GENxplor was recently selected as a finalist for the Compound Semiconductor Manufacturing Award 2014. Voting is open through February 14th and can be found at www.csawards.net/voting.
