News Article
Plessey orders Ferrotec metallisation tool
The UEFC-4900 will bring the Auratus deposition process enhancement methodology benefits to Plessey's MaGIC LED production line
Ferrotec Corporation has confirmed that the first Temescal UEFC-4900 will be delivered to Plessey Semiconductors.
Plessey’s proprietary MaGIC process produces a unique, thin layer of GaN-on-Silicon and the UEFC-4900 offers the benefits of the Auratus deposition process to attain near-perfect uniformity and reduction in material consumption.
UEFC-4900 system
“At only 2.5 µm for both buffer and epitaxial layer, our MaGIC process uses a much thinner GaN layer compared to the 8 µm thickness typical on most other LED processes,” says Mike Snaith, operations director at Plessey. “When you’re working with this level of precision, the uniformity and efficiency that you can achieve with a Temescal system is essential. The UEFC-4900 will be an excellent upgrade from our FC-2800 platform with its Auratus enhancements such as increased capacity, faster throughput and reduced cost of operations.”
“Plessey is making tremendous inroads into reducing the cost of high brightness LEDs with its unique GaN-on-Silicon process. By producing high performance GaN LED structures on standard silicon substrates, Plessey is able to deliver industry-standard performance at a dramatically reduced cost of manufacture,” Gregg Wallace, managing director of Ferrotec’s Temescal division, comments.
“With the UEFC-4900, our most advanced Auratus process enhancements and our excellent local support, this tool will help Plessey achieve larger batch sizes and improved efficiencies, all while maintaining the critically precise process parameters,” Wallace adds.
Plessey’s proprietary MaGIC process produces a unique, thin layer of GaN-on-Silicon and the UEFC-4900 offers the benefits of the Auratus deposition process to attain near-perfect uniformity and reduction in material consumption.
UEFC-4900 system
“At only 2.5 µm for both buffer and epitaxial layer, our MaGIC process uses a much thinner GaN layer compared to the 8 µm thickness typical on most other LED processes,” says Mike Snaith, operations director at Plessey. “When you’re working with this level of precision, the uniformity and efficiency that you can achieve with a Temescal system is essential. The UEFC-4900 will be an excellent upgrade from our FC-2800 platform with its Auratus enhancements such as increased capacity, faster throughput and reduced cost of operations.”
“Plessey is making tremendous inroads into reducing the cost of high brightness LEDs with its unique GaN-on-Silicon process. By producing high performance GaN LED structures on standard silicon substrates, Plessey is able to deliver industry-standard performance at a dramatically reduced cost of manufacture,” Gregg Wallace, managing director of Ferrotec’s Temescal division, comments.
“With the UEFC-4900, our most advanced Auratus process enhancements and our excellent local support, this tool will help Plessey achieve larger batch sizes and improved efficiencies, all while maintaining the critically precise process parameters,” Wallace adds.
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