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Jenoptik starts to equip new high-tech fab


New opto fab in Dresden to receive state-of-the-art electron-beam lithography system

Photonics company Jenoptik is investing a low double-digit million-euro amount in a state-of-the-art system for the high-tech fab currently under construction in Dresden, Germany.

The new electron-beam lithography system (E-Beam) will be used to manufacture high-precision micro-optical components for customers in the semiconductor and optical communication sectors. The manufacturer is the Jena based e-beam technology specialist Vistec Electron Beam GmbH. The system will be delivered at the beginning of 2025.

This type of electron-beam lithography system can 'write' structures with a precision of around 10nm on substrates up to 300 mm in diameter.

Jenoptik has been active in Dresden since 2007. With the new high-tech fab at Airportpark Dresden, the company is consolidating its production, which is currently spread across several small external sites, while at the same time expanding its capacities. The clean room production in the new fab will cover 2,000 square metres with clean room areas of classes ISO 5 and 3.

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