KDF Introduces Next Generation 654NTX In-Line Batch Sputtering System
ORANGEBURG, N.Y. KDF, a leading supplier of new and remanufactured physical vapor deposition (PVD) batch in-line systems, today introduced the 654NTX in-line batch sputtering system. Capable of integration with current systems, the new 654NTX was developed to provide increased volume capacity by enabling multiple substrate material processing, or "multiplexing." Aimed at the rapidly growing communication industry, the tool will be available for shipping in March 2000.
"This advanced in-line batch sputtering system effectively raises the bar for production-worthy tools. KDF has simultaneously improved throughput, uniformity and yield capability with the 654NTX," commented Kurt Flechsig, president of KDF. "The tool can be seamlessly integrated into existing production solutions, thereby limiting the costs associated with upgrading to next-generation tools."
Featuring new cathode selectable collimator technology, the 654NTX substantially increases lift-off performance, an enabling capability for sputtering, thereby raising the overall cost effectiveness. Four thicker and longer cathodes, available in INSET(TM) design, provide increased uniformity, utilization and life capability for next-generation applications, without abandoning proven, reliable processes. Further, the tool offers hi-vacuum, load lock and high speed batch processing. The 654NTX s small footprint, 12x12 substrate area and improved throughput provides users with better utilization of materials.
Developed for Gallium Arsenide (GaAs) and other compound semiconductor applications, the 654NTX can also be applied to the full-range of next generation microelectronic component manufacturing. One of three new tools introduced by KDF in the last 18 months, the 654 NTX is demonstrative of the company s commitment to constantly evaluating and providing new products and methods for its diversified customer base.
The worldwide market for batch in-line sputter and etch systems is worth approximately $200-$250 million per year. The systems are used in the production of GaAs integrated circuits, primarily marketed to the telecommunications industry. KDF systems are used in the production of electronic devices across multiple markets.
About KDF Electronic & Vacuum Services, Inc.
KDF Electronic & Vacuum Services, Inc., produces original and remanufactured batch inline-sputtering tools for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of ink jet printers, photomasks, telecommunications network products, semiconductors, micromachines and others. KDF is located in Orangeburg, New York, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea. Additional information about KFD products is available at www.kdf.com
CONTACT:
The Loomis Group, Inc.: Charla Jones, 617-638-0022,
charla@loomisgroup.com
KDF Electronic & Vacuum: Kurt Flechsig, 914-398-2000,
kurt@kdf.com
Todd Plaisted, 914-398-2000,
todd@kdf.com
The Loomis Group, Inc.: Charla Jones, 617-638-0022,
charla@loomisgroup.com
KDF Electronic & Vacuum: Kurt Flechsig, 914-398-2000,
kurt@kdf.com
Todd Plaisted, 914-398-2000,
todd@kdf.com
E-mail: todd@kdf.com
Web site: http://www.kdf.com
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