TriQuint Semiconductor Orders Additional Mattson CVD Systems
Mattson CVD Systems Help Expand Production of Semiconductors for Communications Industry
Fremont, CA. Mattson Technology, Inc. (Nasdaq:MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, today announced it has received a multimillion-dollar follow-on order for multiple Aspen II plasma-enhanced chemical vapor deposition (PECVD) systems from TriQuint Semiconductor, Inc. Installation of the Aspen CVD systems is expected to begin in April.
TriQuint, a leading provider of advanced gallium arsenide (GaAs) semiconductor devices used extensively in the communications industries, will install the systems at its newly expanded facility in Hillsboro, Ore. "The tremendous growth of worldwide communications applications has fueled demand for GaAs devices," said Brad Mattson, Mattson Technology s CEO. "As a result, chipmakers need solutions that provide both production proven technology and high productivity. We look forward to helping TriQuint meet both its manufacturing and business objectives."
About Aspen II CVD
The Aspen II CVD system deposits silane-based films such as oxide, oxynitride and nitride, as well as TEOS-based oxide films. Mattson offers a full suite of PECVD applications: ARC layers for excellent CD control; etch stop layers for use with low k materials; passivation layers; IMD underlayers, low temperature capping layers; and low k FSG layers. The system can be configured with one or two multi-station process chambers. Each chamber can process four wafers at a time, providing extremely high throughput without sacrificing process performance. Mattson s plasma enhanced chemical vapor deposition (PECVD) technology allows the system to process wafers at the relatively low temperature of 400 degrees Celsius or less, required for processing after aluminum metallization layers are deposited. Film stress and density can be controlled independent of process chemistry by the use of a low frequency radio frequency bias.
About Aspen II CVD
About Mattson Technology Mattson Technology Inc., is a leading supplier of semiconductor process equipment for photoresist strip/etch, chemical vapor deposition, epitaxial and rapid thermal processing. The company s products combine advanced process technology on a high productivity platform, backed by industry-leading support. Since beginning operations in 1989, the company s core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. Headquartered in Fremont, Calif., the company maintains sales and support centers throughout the United States, Europe, Asia/Pacific and Japan. For more information, please contact Mattson Technology Inc., 2800 Bayview Drive, Fremont, Calif. 94538. Telephone: 800/MATTSON. Fax: 510/657-0165. Internet: www.mattson.com.
Contact:
Mattson Technology Inc.
Bernie Wood, 510/492-6389
bernie.wood@mattson.com
or
The Loomis Group, Inc.
Vincent Mayeda, 415/882-9494
vincent@loomisgroup.com
Mattson Technology Inc.
Bernie Wood, 510/492-6389
bernie.wood@mattson.com
or
The Loomis Group, Inc.
Vincent Mayeda, 415/882-9494
vincent@loomisgroup.com
E-mail: vincent@loomisgroup.com
Web site: http://www.mattson.com
