FEI Announces Order From Leading Supplier Of Communications Semiconductors
HILLSBORO, OR. FEI Company (NASDAQ: FEIC) today announced a multiple unit order totaling nearly $3.0 million from a leading supplier of semiconductor system solutions for communications electronics. The order combines FEI’s advanced focused ion beam photomask repair with stylus nano-profilometry from Surface/Interface. This unique solution will provide advanced applications for high accuracy repair and non-destructive characterization on current and next generation production photomasks.
“We are pleased to be working with this industry-leading customer,” commented Vahé Sarkissian, FEI’s president and chief executive officer. “FEI is able to deliver a total solution for mask repair supporting the customer’s mask fabrication process. With products from both FEI and our partner Surface/Interface, we will also work closely with the customer on a collaborative development project to define the next generation in mask repair solutions.”
The combined equipment, which will deliver advanced photomask repair and precise three dimensional surface profiles of mask surfaces, is scheduled for delivery in the third quarter of this year.
About FEI: The Structural Process Management Company™
FEI Company is a leading supplier of charged particle beam systems, including FIB systems, DualBeam systems, scanning and transmission electron microscopes, and components. FEI serves the research, development and production needs of customers in semiconductor, data storage, and industry/institute markets. FEI products are based on a unique combination of technologies that provide advanced three dimensional metrology, device editing, trimming and structural analysis for management of sub-micron structures including those found in integrated circuits, high density magnetic storage devices, industrial materials, chemical compounds, biological structures and genomes. FEI has more than 1,300 employees worldwide, with manufacturing operations located in Hillsboro, Oregon; Peabody, Massachusetts; Eindhoven, The Netherlands; and Brno, Czech Republic.
About Surface/Interface
Surface/Interface Inc. (S/II), Sunnyvale, California, is a capital equipment supplier specializing in the design and manufacture of advanced metrology and thin film measurement systems for production control and new product development programs in the semiconductor, photomask, and data storage industries. Critical dimension measurement is a defined critical path issue due to the accelerated decrease in line width geometry on both wafers and photomasks. S/II’s SNP (Stylus NanoProfilometer) Metrology Systems are capable of providing nanometer-scale, 3-dimensional surface topography measurements, in a non-destructive manner, on conductive or non-conductive substrates. S/II’s TFA tools provide composition and thickness information of carbon overcoats for the data storage industry. S/II has a strategic agreement with FEI Company of Hillsboro, Oregon, to represent and handle customer service for the SNP Product Line in North America and Europe.
Contact:
Dan Zenka, APR
FEI Corporate Communications
Tel: 503/844.2695
dzenka@feico.com
Dan Zenka, APR
FEI Corporate Communications
Tel: 503/844.2695
dzenka@feico.com
E-mail: dzenka@feico.com
