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News Article

SAL Granted Japanese Patent for Advanced Alignment Patterns

Source: SAL, Inc.

Also: Sanders Issues Final Acceptance of SAL Lithography System

South Burlington, VT, USA. SAL, Inc. was recently granted a Japanese patent for SAL s proprietary alignment patterns and alignment method, an enabler for advanced X-ray stepper performance. This patent covers intellectual property already protected by American and European patents.

"We are pleased that this Japanese patent has issued. This ensures protection of valuable SAL intellectual property in all major semiconductor equipment markets", said Dr. Daniel Fleming, President and CEO of SAL, Inc.

The SAL ALX70 automatic alignment system uses an advanced pattern recognition system and high-speed digital signal processors to quickly and accurately align patterns on X-ray masks with patterns on wafers. The proprietary SAL alignment patterns and alignment method allows the SAL system to deliver the accuracy required by 150 nm GaAs devices used for high-frequency and low-noise applications.

Robert Selzer, Senior Vice President of Technology at SAL, added, "This particular patent complements other SAL patents awarded and patents pending. The performance of our newest alignment system, the ALX70, is improved by use of the specially designed alignment patterns and alignment method that this patent covers."

Sanders Issues Final Acceptance of SAL Lithography System

Sanders, a Lockheed Martin Company, issued the final acceptance of the SAL XRS2000 NanoPulsar System. The system, installed at Sanders Microwave Electronics Center in Nashua, NH, is the first integrated Point Source X-ray Lithography System. Sanders has begun production of high-frequency GaAs ICs with the SAL NanoPulsar System.

"The transition of this system into production is an important milestone in the commercialization of X-ray lithography. We can now offer data on operating costs and reliability of the SAL XRS2000 NanoPulsar System", said Ken Mason, Vice President of Sales and Marketing at SAL. "This will allow our customers to see the technological and economic benefits of Point Source X-ray Lithography."

The SAL XRS2000 NanoPulsar System is designed for high-performance devices with feature sizes of 150 nm, although initial data show the system capable of printing features beyond 125 nm. SAL and its strategic partners are developing subsystems and materials to extend the technology to 100 nm and beyond.

"X-ray lithography enables Sanders to produce GaAs products in higher quantities with high performance characteristics than competing lithography choices. The SAL XRS2000 NanoPulsar System allows Sanders to offer advanced ICs to both the military and commercial markets", said Dr. Daniel Fleming, President and CEO at SAL.

About SAL, Inc.: SAL, Inc. is a privately held, U.S. majority-owned company, formed in 1994 as a spin-off from Karl Suss. SAL is the undisputed leader in x-ray lithography stepper technology with a tradition of innovation, solid product support, and the greatest number of steppers manufactured. SAL has more experience in x-ray lithography than all other stepper manufacturers combined. SAL s efforts are complemented by the work of scientists and researchers at companies and universities throughout the United States and across the globe. SAL s website is http://www.XRayLitho.com.

Contact: Jeff Hullstrung, Marketing Manager, SAL, Inc. Tel: +1 802 652-0055 X143 JHullstrung@XRayLitho.com

 

Jeff Hullstrung, Marketing Manager, SAL, Inc.
Tel: +1 802 652-0055 X143
JHullstrung@XRayLitho.com
 
E-mail: JHullstrung@XRayLitho.com
Web site: http://www.XRayLitho.com
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