n&k Technology, Inc. Secures $2.4 Million in Orders for High Throughput Metrology Tool
Source: n&k Technology, Inc.
Company Sees Growing Demand for Inline Test and Measurement Equipment For Manufacture of Integrated Circuits
San Jose, CA. n&k Technology, Inc., a pioneer in manufacturing equipment for reliable and accurate thin film characterization and metrology, optical properties measurements, and equipment for critical dimension measurements, today announced that the company has received orders in excess of $2.4 million for its high throughput metrology tool. The orders were placed by three undisclosed customers, primarily for use in the manufacture of gallium arsenide (GaAs) integrated circuits (ICs), widely used in communications devices such as cellular and PCS handsets and other electro-optic equipment. n&k s family of analyzers, designed for use in a variety of markets, including semiconductor, data storage, flat panel display, communications, and optical and industrial coatings, employ a fast, non-destructive, patented spectrophotometric method of determining material properties and are ideally suited for integration into the manufacturing environment.
"Today, IC manufacturers rely heavily on stand alone metrology and inspection tools for their process control needs," said Dr. Rahim Forouhi, president and co-founder of n&k Technology. "However, we are now seeing a growing demand for inline measurement capabilities, where the actual process control equipment resides directly within the frame of a processing tool. And there is a particularly strong demand in the wireless infrastructure market where the design and fabrication of high-performance GaAs ICs are an integral part of the industry."
n&k s approach to thin film characterization and analysis has a unique advantage in the IC fab environment because not only is it easily integrated with the actual fabrication equipment, it is also accurate regardless of changes in environment or manufacturing process. n&k Analyzers simultaneously determine thickness, refraction index (n), extinction coefficient (k), and energy band gap from spectrophotometric measurements, and also measure reflectance, transmittance, and interface roughness for a wide variety of thin films. Furthermore, n&k s patented methodology makes it possible to establish a correlation between the optical properties of the materials and other qualities such as composition, resistivity and density.
About n&k Technology, Inc.
n&k Technology, Inc., located in the Silicon Valley, is a privately held company quickly gaining recognition as a pioneer in manufacturing equipment for reliable and accurate thin film characterization and metrology, optical properties measurements, and critical dimension measurements for a variety of markets including semiconductor, data storage, flat panel displays, communication, and optical and industrial coatings. n&k Technology s cost-effective, non-destructive and easy to use instrumentation delivers "the true measure" with superior resolution, enabling users to characterize virtually any combination of thin films, substrates, and structures. n&k Analyzers are also ideally suited for challenging in-situ measurements. More information about n&k Technology can be found on the World Wide Web at www.nandk.com.
Contact: Judy Plummer of Al Shugart International, Tel: 831-464-4745 or jplummer@alshugart.com for n&k Technology, Inc
Judy Plummer of Al Shugart International,
Tel: 831-464-4745
or
jplummer@alshugart.com for n&k Technology, Inc
E-mail: jplummer@alshugart.com
Web site: http://www.nandk.com
