Technical Insight
JMAR receives funding for XRL development (Materials and Equipment)
JMAR Technologies (San Diego, CA) has received an additional $9 million of funding from the US Army Research Laboratory/DARPA to continue development of its X-ray lithography (XRL) source. JMAR was recently awarded $3.8 million from the same agency to integrate the company s 25 W collimated laser plasma X-ray source with a lithography stepper manufactured by SAL (South Burlington, VT). The collimator directs the X-rays with a wavelength of 1 nm onto the mask/wafer target. JMAR is to produce a fully integrated XRL system for installation in an established GaAs manufacturing facility.
.jpeg){kind=logo}
