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Wuhan National Lab approves Vistec's E-beam lithography system

The tool is used for advanced nano-lithography applications, particularly in direct writing of both R&D and production gallium arsenide devices

 Vistec Lithography has announced that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST), has signed off its electron-beam lithography system Vistec EBPG5000pES. 


 Vistec EBPG5000+ electron-beam lithography system

The WNLO, HUST and Vistec consider this to be a major milestone in their strategic partnership.

The Vistec EBPG5000pES electron-beam lithography system will enable WNLO to further strengthen its position in photonics and optoelectronics research and development. "The EBPG5000pES facilitates us to achieve all the lithography challenges we are facing in our research. In respect to application support and service we know that we can count on the Vistec team as our strategic partner," stated Jinsong Xia, director of the Optoelectronic Micro & Nano Fabrication and Characterisation Facility (OMFC) at WNLO.

The Vistec EBPG5000pES is a high-end lithography tool based on reliable and well-proven system architecture. With its flexible electron-optical column and high brightness TFE source, allowing 50 and 100kV operation, the system provides a spot size down to < 2.2nm, thus enabling nano-lithography structures smaller than 8nm to be routinely generated. The system incorporates an interactive graphical user interface that provides ease of use for diverse, multiuser, university type environments.

"We are very pleased to have reached this significant milestone in our partnership with WNLO at HUST, who can be assured that Vistec will be supporting them to the very best," said Erwin Mueller, Managing Director Vistec Lithography, B.V.. "The electron beam lithography system at WNLO is the first operational Vistec EBPG5000pES in the P.R. China, which opens great opportunities to a sustainable business development for Vistec in that region."
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