Ohio selects TNSC for nitride and oxide growth
Taiyo Nippon Sanso Corporation (TNSC), a Japanese industrial gas business company and The Ohio State University have announced that Ohio State will purchase and use a TNSC SR4000HT-RR-LV metal organic chemical vapor deposition (MOCVD) reactor for its advanced nitride research and development and a halide vapor phase epitaxy (HVPE) reactor for advanced gallium oxide applications.
“Taiyo Nippon Sanso is very proud to establish a relationship with The Ohio State University for research and development of gallium nitride and gallium oxide materials and devices. Taiyo Nippon Sanso is looking forward to working with Professors Steven A. Ringel, Siddharth Rajan, and Hongping Zhao and The Ohio State University community to further establish its reputation as a center of excellence in the field of wide band gap semiconductor research and development,” said TNSC Senior Corporate Officer Kunihiro Kobayashi.
“The Ohio State University is very excited to partner with Taiyo Nippon Sanso,” said Professor Steven A. Ringel, Associate Vice President of Research at The Ohio State University, and Executive Director of Ohio State’s Institute for Materials and Manufacturing Research (IMR).
“The selection of the TNSC MOCVD and HVPE systems and our partnership with Taiyo Nippon Sanso enables The Ohio State University to expand its epitaxial growth facilities with these state[1]of-the-art growth capabilities for nitrides and oxides. We are eager to leverage TNSC technology to push the boundaries of wide and ultrawide bandgap semiconductor research and development.”
The MOCVD and HVPE reactors will be installed at Nanotech West Lab, a 36,000-square-foot shared user facility servicing the Ohio State materials community. The lab is operated by IMR, a multidisciplinary institute that provides infrastructure support and development, as well as management of major research facilities at Ohio State.
