Boise State university is first to qualify Aixtron tool
Boise State University has qualified a new Aixtron 2D Close Coupled Showerhead MOCVD system for multi-wafer growth of wide bandgap III-nitrides and 2D materials. This is the first system of its kind to be qualified by a US based university and was made possible through the university’s strong partnerships with the NextFlex Manufacturing USA Institute and Air Force Research Laboratory.
The university has also benefited from recent investments in other semiconductor research facilities, including new electrical and thermal properties characterisation tools for fundamental transport studies across a wide temperature range, as well as a Bruker nanoIR3 AFM equipped with AFM-IR, scanning thermal microscopy, and scattering-type Scanning Near-field Optical Microscopy. With support from the Department of Energy Boise State is also establishing a neutron science laboratory equipped with two Thermo Scientific P 385 neutron generators (D-T and D-D) for producing fission and fusion relevant neutrons (≤14 MeV).
“We are excited to unveil the first 2D CCS Aixtron MOCVD system at a US University and make it available for collaborations through the Next Flex Manufacturing USA Institute, the Midwest Microelectronics Commons, and the National Science Foundation’s ATOMIC Center,” said David Estrada – a professor of Materials Science and Engineering and Site Director for ATOMIC.
“Such unique instruments will allow us to help advance applications of semiconductor thin films for next generation power electronics and energy efficient computing, while also providing hands on training for the next generation microelectronics workforce.”
The tool will become available to a national user base through a service centre model currently in development with national microelectronics and hybrid electronics consortia.
Pictured above is Michael Curtis, a third-year doctoral student in Materials Science and Engineering, who led the system’s qualification.
